MILPITAS, Calif., July 10, 2017 (GLOBE NEWSWIRE) -- Nanometrics Incorporated (NASDAQ:NANO), a leading provider of advanced process control systems, today announced the release of NanoDiffract® 4, the latest version of its industry-leading optical critical dimension (OCD) modeling and analysis software with an optimized user interface. NanoDiffract 4 enhances user productivity with added features and options resulting in reduced time-to-solution for the most complex devices. The software is designed to improve modeling and analysis for the latest-generation high-aspect-ratio structures used in DRAM and 3D-NAND, as well as handling the most complex 3D FinFET logic/foundry structures. The NanoDiffract 4 analysis engine coupled with its high-fidelity modeling accuracy greatly improves metrology performance, enabling enhanced in-line sensitivity to critical steps, leading to better factory control.
"Nanometrics' OCD metrology has been broadly adopted by our customers across all device types and key unit operations in R&D and production for its productivity and sensitivity," commented Adrian Wilson, vice president and general manager of the software & analytics business unit at Nanometrics. "Our customers have to manage very narrow process tolerances, and with the latest Diffract 4 they get rapid visibility in-line to control their most challenging processes."
NanoDiffract 4 is in production on the latest Nanometrics Atlas®, IMPULSE® and NanoGen™ systems for thin film and OCD metrology and currently deployed across numerous customer sites for advanced memory and logic/foundry devices. Combined with the company's advanced metrology platforms, the latest NanoDiffract 4 software further extends Nanometrics' comprehensive solutions in process control metrology for the most challenging 3D device structures, including a new SRAM optimizer and 3D-NAND configuration for support of 100+ layers.
For a review of NanoDiffract 4 and the full suite of process control metrology systems, visit Nanometrics at SEMICON West July 11-13, Moscone Center, San Francisco, booth #5844 North hall.
Nanometrics is a leading provider of advanced, high-performance process control metrology and inspection systems used primarily in the fabrication of semiconductors and other solid-state devices, including sensors, optoelectronic devices, high-brightness LEDs, discretes and data storage components. Nanometrics' automated and integrated metrology systems measure critical dimensions, device structures, topography and various thin film properties, including three-dimensional features and film thickness, as well as optical, electrical and material properties. The company's process control solutions are deployed throughout the fabrication process, from front-end-of-line substrate manufacturing, to high-volume production of semiconductors and other devices, to advanced three-dimensional wafer-level packaging applications. Nanometrics' systems enable advanced process control for device manufacturers, providing improved device yield at reduced manufacturing cycle time, supporting the accelerated product life cycles in the semiconductor and other advanced device markets. The company maintains its headquarters in Milpitas, California, with sales and service offices worldwide. Nanometrics is traded on NASDAQ Global Select Market under the symbol NANO. Nanometrics' website is http://www.nanometrics.com.
Forward Looking Statements
Certain statements in this press release are forward-looking statements that involve a number of risks and uncertainties that could cause actual results to differ materially from those described in this release. Although Nanometrics believes that the expectations reflected in the forward-looking statements are reasonable, actual results could differ materially from these expectations due to a variety of factors, including, but not limited to: failure of customers to adopt the new products; decreased levels of industry spending; Nanometrics' inability to gain additional market share, increase sales, ship products as scheduled, achieve customer acceptance of new products or outperform the industry; decreased demand for Nanometrics' products; shifts in the timing of customer orders and product shipments; technology adoption rates; changes in customer and product mix; changes in market share; changes in operating expenses; and general economic conditions. For additional information and considerations regarding the risks faced by Nanometrics that could cause actual results to differ materially, see its annual report on Form 10-K for the year ended December 31, 2016, as filed with the Securities and Exchange Commission on March 3, 2017 including under the caption "Risk Factors," as well as other periodic reports filed with the SEC from time to time. Nanometrics disclaims any obligation to update information contained in any forward-looking statement, except as required by law.
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